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Information card for entry 2300211
Preview
| Coordinates | 2300211.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | Lu2 O5 Si |
|---|---|
| Calculated formula | Lu2 O5 Si |
| Title of publication | Structural and thermal properties of the monoclinic Lu~2~SiO~5~ single crystal: evaluation as a new laser matrix |
| Authors of publication | Cong, Hengjiang; Zhang, Huaijin; Wang, Jiyang; Yu, Wentao; Fan, Jiandong; Cheng, Xiufeng; Sun, Shangqian; Zhang, Jian; Lu, Qingming; Jiang, Chunjian; Boughton, Robert I. |
| Journal of publication | Journal of Applied Crystallography |
| Year of publication | 2009 |
| Journal volume | 42 |
| Journal issue | 2 |
| Pages of publication | 284 - 294 |
| a | 10.255 ± 0.0002 Å |
| b | 6.6465 ± 0.0002 Å |
| c | 12.3626 ± 0.0004 Å |
| α | 90° |
| β | 102.422 ± 0.001° |
| γ | 90° |
| Cell volume | 822.91 ± 0.04 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 3 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | I 1 2/a 1 |
| Hall space group symbol | -I 2ya |
| Residual factor for all reflections | 0.0311 |
| Residual factor for significantly intense reflections | 0.0295 |
| Weighted residual factors for significantly intense reflections | 0.0713 |
| Weighted residual factors for all reflections included in the refinement | 0.0722 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.168 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
Version history
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Users of the data should acknowledge the original authors of the
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