Crystallography Open Database

Information card for entry 4308865

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4308864 << 4308865 >> 4308866

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Coordinates	4308865.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C36 H52 Cl2 N2 O2 Os
Calculated formula	C36 H52 Cl2 N2 O2 Os
SMILES	[Os]123(Cl)(Cl)Oc4c(C=[N]2[C@@H]2[C@@H]([N]3=Cc3cc(cc(c3O1)C(C)(C)C)C(C)(C)C)CCCC2)cc(cc4C(C)(C)C)C(C)(C)C.[Os]123(Cl)(Cl)Oc4c(C=[N]2[C@H]2[C@H]([N]3=Cc3cc(cc(c3O1)C(C)(C)C)C(C)(C)C)CCCC2)cc(cc4C(C)(C)C)C(C)(C)C
Title of publication	Chiral Osmium Complexes with Sterically Bulky Schiff-Base Ligands. Crystal Structures of Os(IV) Derivatives and the Reactivity and Catalytic Cyclopropanation of Alkenes with EDA
Authors of publication	Jing Zhang; Jiang-Lin Liang; Xian-Ru Sun; Hai-Bing Zhou; Nian-Yong Zhu; Zhong-Yuan Zhou; Philip Wai Hong Chan; Chi-Ming Che
Journal of publication	Inorganic Chemistry
Year of publication	2005
Journal volume	44
Pages of publication	3942 - 3954
a	12.1571 ± 0.0011 Å
b	13.3553 ± 0.0012 Å
c	13.3721 ± 0.0012 Å
α	69.723 ± 0.002°
β	81.066 ± 0.002°
γ	71.178 ± 0.002°
Cell volume	1925.4 ± 0.3 Å³
Cell temperature	294 ± 2 K
Ambient diffraction temperature	294 ± 2 K
Number of distinct elements	6
Space group number	2
Hermann-Mauguin space group symbol	P -1
Hall space group symbol	-P 1
Residual factor for all reflections	0.054
Residual factor for significantly intense reflections	0.0445
Weighted residual factors for significantly intense reflections	0.1095
Weighted residual factors for all reflections included in the refinement	0.1183
Goodness-of-fit parameter for all reflections included in the refinement	0.812
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

Version history

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